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Approved code of practice for safety in photoengraving and lithographic processes [online]

Call no.:
Internet only - free access
Author:
Length:
26 p.
Publisher:
Wellington, N.Z.: Dept. of Labour
Year:
1993
ISBN-ISSN:
0477035345
Type:
Electronic resource
Subject:
Abstract:
The particular process types to which this code applies are as follows:-
- Etching of metal plates, in particular those made of either magnesium or zinc, with a corrosive fluid which is most often nitric acid.
- Washout of photopolymer plates with an organic chemical as a solvent. The plates may be wholly of photopolymer material and hence flexible (e.g. Cyrel process), or they may have a metal backing with a photopolymer upper layer as the soluble surface (e.g. Nyloprint process).
- Lithographic processes which involve etching with corrosive fluids. It must be pointed out that this does not apply to all lithographic processes, but generally to the so-called 'multi-metal' systems where an upper plate layer of chromium is partially removed by etching to reveal the underlying
copper or brass layer which provides the image. The deep-etch plate process, involving a single metal layer, is a further example of a process in this category.
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